Thin Film Thickness Measurement(K-MAC)
Spectra Thick, K-MAC's Thin Film Thickness Measurement System, is an adapted optical technology method. Thus the interference phenomenon between the reflected lights on the film surface and the substrate surface or the phase difference of lights determines the properties of the film. In this way we can measure not only the film thickness but also the optical constant. If the film is transparent and maintains the optical interference, any sample can be measured with Spectra Thick. Each layer's thickness of the multilayer film can be measured via mathematical calculation. Thanks to a user-friendly interface, the operation is easy. No damage is caused to the sample and a wide range of thickness, from Åto dozens ㎛, can be rapidly measured.
▶ Non-Contact/Non-Destructive
▶ Reflectometer
▶ Real-time measurement, Multi-spot display
▶ Windows based S/W (Excel, Origin, MS-Word save)
▶ Various n, k model (Cauchy, Cauchy Expotential, Sellmeier)
▶ 2D, 3D mapping data Display (point by point)
▶ Semi-automatic mechanism stage control
▶ Fast measurement, Easy operation
▶ CCD Camera + Auto Focusing
Thickness measurement equipment is a suitable model for campus or lab`s budget to purchase.
SpectraThickseries, K-MAC thickness measurement system,has different models for R&D and Laboratories.
#케이맥 #KMAC #FPD #LCD #OLED #TFT #박막 #박막두께측정기
