Plasma cleaning is a simple, fast and inherently clean alternative wafer preparation treatment. Oxygen plasma generates UV light together with reactive oxygen species which are extremely effective at the removal of both organic contamination and also complete PR layers. Both cleaning and PR removal are performed in the same equipment under the same conditions, with only the time of exposure to the oxygen plasma being varied.
At Henniker Plasma 'we are passionate about plasma'® and we want to share our knowledge with you.
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